Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide Films
Author:
Affiliation:
1. Department of Materials Science and Engineering, National Cheng Kung University
2. Department of Electronics Engineering & Nano Technology Research and Development Center, Kun Shan University of Technology
Publisher
Japan Institute of Metals
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.jstage.jst.go.jp/article/matertrans/46/11/46_11_2530/_pdf
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4. 4) H. Kumagai, M. Matsumoto, K. Toyoda and M. Obara: J. Mater. Sci. Lett. 15 (1996) 1081–1083.
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