Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/BF00274914.pdf
Reference14 articles.
1. H. Sato, T. Minami, S. Takata and T. Yamada, Thin Solid Films 236 (1993) 27.
2. E. Fujii, A. Tomozawa, S. Fujii, H. Torii, M. Hattori and R. Takayama, Jpn. J. Appl. Phys. 32 (1993) L1448.
3. O. Elsenhans, P. Böni, H. P. Friedli, H. Grimmer, P. Buffat, K. Leifer, J. Söchtig and I. S. Anderson, Thin Solid Films 246 (1994) 110.
4. G. S. Higashi and C. G. Flemings, Appl. Phys. LetT. 55 (1989) 1963.
5. J. F. Fan, K. Sugioka and K. Toyoda, Jpn. J. Appl. Phys. 30 (1991) L1139.
Cited by 141 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. COMPARATIVE THERMAL KINETIC ANALYSIS OF NICKEL HYDROXIDE NANOPARTICLES THROUGH CHEMICAL PRECIPITATION AND SOL–GEL ROUTES;Surface Review and Letters;2024-03-26
2. Epitaxy of Nio Thin Films of Varied Thickness on Muscovite Mica, C-Al2o3, and Si Substrates;2024
3. Effect of Oxygen-Evaporation-Preventative Post-Annealing Gas Conditions on NiO Thin Films;Coatings;2023-11-15
4. Synthesis, structural and magnetic properties of pure and Li2+ doped NiO nanomaterial;Materials Today: Proceedings;2021-11
5. The nonlinear optical properties of nickel nano-films in the cw regime: Proposed model;Optical Materials;2021-11
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3