Author:
Fan Jia-Fa,Sugioka Koji,Toyoda Koichi
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
72 articles.
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1. Novel Energetic Co-Reactant for Thermal Oxide Atomic Layer Deposition: The Impact of Plasma-Activated Water on Al2O3 Film Growth;Nanomaterials;2023-12-10
2. Atomic layer deposition of α-Al2O3 from trimethylaluminum and H2O: Effect of process parameters and plasma excitation on structure development;Journal of Crystal Growth;2023-05
3. Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing;Chemistry of Materials;2023-02-22
4. Mechanistic Mapping of Ozone-Dosed Al2O3 Atomic Layer Deposition Half-Cycles;Industrial & Engineering Chemistry Research;2022-07-01
5. A review of band structure and material properties of transparent conducting and semiconducting oxides: Ga2O3, Al2O3, In2O3, ZnO, SnO2, CdO, NiO, CuO, and Sc2O3;Applied Physics Reviews;2022-03