Atomic layer deposition of α-Al2O3 from trimethylaluminum and H2O: Effect of process parameters and plasma excitation on structure development
Author:
Funder
European Regional Development Fund
European Commission
Eesti Teadusagentuur
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
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3. Al alloy protection via ultra-thin ceramic coatings and different surface pretreatments;Merisalu;Surf. Coat. Technol.,2022
4. Effects of moisture-proof back passivation layers of Al2O3 and AlxTi1–xOy films on efficiency improvement and color modulation in transparent a-Si: H solar cells;Kim;ACS Appl. Mater. Interfaces,2021
5. Preparation of Cr2O3/Al2O3 bipolar oxides as hydrogen permeation barriers by selective oxide removal on SS and atomic layer deposition;Zhang;Int. J. Hydrogen Energy,2019
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