Molecular Dynamics Simulation of Electromigration in Nano-sized Metal Lines
Author:
Affiliation:
1. The Institute of Scientific and Industrial Research, Osaka University
2. A&E Technology Center, NEC Corporation
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/37/3/37_3_454/_pdf
Reference12 articles.
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3. 3) J. R. Black: 6th Annual Proc. on Reliability Physics (1967), 148.
4. 4) M. J. Attardo, R. Rutledge and R. C. Jack: J. Appl. phys., 42 (1971), 4343.
5. 5) J. M. Schoen: J. Appl. phys., 51 (1980) 513.
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