Layer or Strip Resistance Measurement by Electron Beam Induced Current Technique in a Scanning Electron Microscope-Reference-Cited by-同舟云学术

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Layer or Strip Resistance Measurement by Electron Beam Induced Current Technique in a Scanning Electron Microscope

Published:2007 Issue:5 Volume:48 Page:949-953
ISSN:1345-9678
Container-title:MATERIALS TRANSACTIONS
language:en
Short-container-title:Mater. Trans.

Author:

Czerwinski Andrzej¹,Pluska Mariusz¹,Ratajczak Jacek¹,Szerling Anna¹,K\\katcki Jerzy¹

Affiliation:

1. Institute of Electron Technology

Publisher

Japan Institute of Metals

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.jstage.jst.go.jp/article/matertrans/48/5/48_48.949/_pdf

Reference13 articles.

1. 1) H. J. Leamy: J. Appl. Phys. 53 (1982) R51–R80.

2. 2) D. K. Schroder: Semiconductor Material and Device Characterization, Second Edition (Wiley-Interscience, New York, 1998) pp. 453–455.

3. 3) K. Kanaya and S. Okayama: J. Phys. D 5 (1972) 43–58.

4. 4) C. Donolato: Appl. Phys. Lett. 43 (1983) 120–122.

5. 5) C. Donolato: Appl. Phys. Lett. 46 (1985) 270–272.

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron Microscopy Studies of Non-Local Effects’ Impact on Cathodoluminescence of Semiconductor Laser Structures;MATERIALS TRANSACTIONS;2011

2. Dependence of cathodoluminescence on layer resistance applied for measurement of thin-layer sheet resistance;Journal of Microscopy;2010-03

3. New approach to cathodoluminescence studies in application to InGaN/GaN laser diode degradation;Journal of Microscopy;2009-10-22

4. Impact of resistance on cathodoluminescence and its application for layer sheet-resistance measurements;Applied Physics Letters;2008-07-28

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