Fine Trace Substrate with 2 μm Fine Line for Advanced Package

Author:

Hu Dyi-Chung1,Lin Puru1,Chen Yu Hua1

Affiliation:

1. NBD, Unimicron Technology Corp

Publisher

Japan Institute of Electronics Packaging

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Next-Generation Dry Film Photoresist for Advanced IC Substrate Applications;2021 16th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT);2021-12-21

2. Trench Wiring Process Applying Electroless Nickel Plating for Fine and High-Aspect-Ratio Pattern;Journal of Photopolymer Science and Technology;2019-06-24

3. Novel Photoresist using Photodeprotectable N-Alkoxybenzyl Aromatic Polyamide;Journal of Photopolymer Science and Technology;2018-06-25

4. Photodeprotectable N-Alkoxybenzyl Aromatic Polyamides;Polymers;2017-06-24

5. Novel Trench Wiring Formation Process using Photosensitive Insulation Film for Next Generation Packaging;Journal of Photopolymer Science and Technology;2016

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