Improvement in Linearity of Calibration Curves Using of Palladium Modifier in Electrothermal Vaporization/ICP-MS and Determination of Ultratrace Metallic Impurities on Silicon Wafers-Reference-Cited by-同舟云学术

Improvement in Linearity of Calibration Curves Using of Palladium Modifier in Electrothermal Vaporization/ICP-MS and Determination of Ultratrace Metallic Impurities on Silicon Wafers

Published:2006 Issue:1326 Volume:114 Page:210-213
ISSN:0914-5400
Container-title:Journal of the Ceramic Society of Japan
language:en
Short-container-title:J. Ceram. Soc. Japan

Author:

MITSUMATA Hiroshi¹,MORI Toshio¹

Affiliation:

1. Lighting Company, Matsushita Electric Industrial Co., Ltd.

Publisher

Ceramic Society of Japan

Subject

Materials Chemistry,Condensed Matter Physics,General Chemistry,Ceramics and Composites

Link

http://www.jstage.jst.go.jp/article/jcersj/114/1326/114_1326_210/_pdf

Reference20 articles.

1. Collection Efficiency of Metallic Contaminants on Si Wafer by Vapor-Phase Decomposition-Droplet Collection.

2. Analytical Chemistry represented by "super" and "ultra". Determination of ultratrace phosphorus and titanium on silicon wafer surface by high resolution ICP-MS.

3. Determination of ultra-trace germanium on a silicon wafer by hydrofluoric acid vapor-decomposition/ microconcentric nebulizer-ICP-MS.

4. Determination of the metallic-impurity distribution on a silicon wafer by the multiple indicator-rod method for liquid-phase dissolution and graphite-furnace AAS.

5. Determination of trace metals on a silicon wafer by acid dissolution and graphite furnace AAS.

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