1. 1. W. Kern, in “Handbook of Semiconductor Wafer Cleaning Technology”, ed. W. Kern, 1992, Noyes Publications, Park Ridge, 8.
2. 2. W. Kern, in “Handbook of Semiconductor Wafer Cleaning Technology”, ed. W. Kern, 1992, Noyes Publications, Park Ridge, 596.
3. Determination of the metallic-impurity distribution on a silicon wafer by the multiple indicator-rod method for liquid-phase dissolution and graphite-furnace AAS.
4. Characterization and Application of the Vapor Phase Decomposition Technique for Trace Metal Analysis on Silicon Oxide Surfaces
5. 5. R. S. Hockett, in “Handbook of Semiconductor Wafer Cleaning Technology”, ed. W. Kern, 1992, Noyes Publications, Park Ridge, 584.