Impact of Single Defects on NBTI and PBTI Recovery in SiO2 Transistors
Author:
Affiliation:
1. Institute for Microelectronics,Christian Doppler Laboratory for Single-Defect Spectroscopy,TU Wien,Vienna,Austria
2. Institute for Microelectronics,TU Wien,Vienna,Austria
3. ams-OSRAM AG,Premstatten,Austria
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10032732/10032733/10032748.pdf?arnumber=10032748
Reference21 articles.
1. Temperature and voltage dependences of the capture and emission times of individual traps in high-k dielectrics
2. Semi-Automated Extraction of the Distribution of Single Defects for nMOS Transistors
3. Relaxation Effects in MOS Devices due to Tunnel Exchange with Near-Interface Oxide Traps;tewksbury;Ph D thesis,1992
4. On the Distribution of Single Defect Threshold Voltage Shifts in SiON Transistors
5. Modeling the VTH fluctuations in nanoscale Floating Gate memories
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