HfO/sub 2/ and HfAlO for CMOS: thermal stability and current transport-Reference-Cited by-同舟云学术

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HfO/sub 2/ and HfAlO for CMOS: thermal stability and current transport

Published: Issue: Volume: Page:
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Container-title:International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224)
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Author:

Zhu W.,Ma T.P.,Tamagawa T.,Di Y.,Kim J.,Carruthers R.,Gibson M.,Furukawa T.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/7704/21092/00979541.pdf?arnumber=979541

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