On the progressive breakdown statistical distribution and its voltage acceleration
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx5/4418847/4418848/04418982.pdf?arnumber=4418982
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Facts and Myths of Dielectric Breakdown Processes—Part II: Post-Breakdown and Variability;IEEE Transactions on Electron Devices;2019-11
2. Time-Dependent Dielectric Breakdown in High-Voltage GaN MIS-HEMTs: The Role of Temperature;IEEE Transactions on Electron Devices;2017-08
3. On the Impact of Time-Zero Variability, Variable NBTI, and Stochastic TDDB on SRAM Cells;IEEE Transactions on Electron Devices;2016-07
4. Influence of gate oxides with high thermal conductivity on the failure distribution of InGaAs-based MOS stacks;Microelectronics Reliability;2016-01
5. Resilience of ultra-thin oxynitride films to percolative wear-out and reliability implications for high-κ stacks at low voltage stress;Journal of Applied Physics;2013-09-07
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