Demonstration of highly scaled FinFET SRAM cells with high-κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Demonstration of highly scaled FinFET SRAM cells with high-κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond

Published:2008-12 Issue: Volume: Page:
ISSN:
Container-title:2008 IEEE International Electron Devices Meeting
language:
Short-container-title:

Author:

Kawasaki H.,Khater M.,Guillorn M.,Fuller N.,Chang J.,Kanakasabapathy S.,Chang L.,Muralidhar R.,Babich K.,Yang Q.,Ott J.,Klaus D.,Kratschmer E.,Sikorski E.,Miller R.,Viswanathan R.,Zhang Y.,Silverman J.,Ouyang Q.,Yagishita A.,Takayanagi M.,Haensch W.,Ishimaru K.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/4786613/4796592/04796661.pdf?arnumber=4796661

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Suppression of Threshold Voltage Variation by H₂ Plasma Improved KrF Photoresist Profile;IEEE Transactions on Electron Devices;2024-09

2. Local Bit-Line SRAM Architecture With Data-Aware Power-Gating Write Assist;IEEE Transactions on Circuits and Systems II: Express Briefs;2023-01

3. FinFET Optimization in the Design of 6T SRAM Cell;Lecture Notes in Electrical Engineering;2020

4. A novel method for source/drain ion implantation for 20 nm FinFETs and beyond;Journal of Materials Science: Materials in Electronics;2019-04-08

5. Analysis of subthreshold SOI FinFET based two stage OTA for low power;Analog Integrated Circuits and Signal Processing;2018-08-20

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP