Author:
Woelfel Christian,Awakowicz Peter,Lunze Jan
Cited by
5 articles.
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1. Robust interval observer for substrate state estimation of nonlinear reactive sputter processes;2023 IEEE Conference on Control Technology and Applications (CCTA);2023-08-16
2. Observability analysis and substrate state estimation of nonlinear reactive sputter processes;2023 24th International Conference on Process Control (PC);2023-06-06
3. Modeling reactive magnetron sputtering: a survey of different modeling approaches;Acta Universitatis Sapientiae, Informatica;2020-07-01
4. Stoichiometry control of the two gas reactive sputtering process;2019 IEEE 19th International Symposium on Computational Intelligence and Informatics and 7th IEEE International Conference on Recent Achievements in Mechatronics, Automation, Computer Sciences and Robotics (CINTI-MACRo);2019-11
5. Model approximation and stabilization of reactive sputter processes;Journal of Process Control;2019-11