Gradient-Based Source and Mask Optimization in Optical Lithography-Reference-Cited by-同舟云学术

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Gradient-Based Source and Mask Optimization in Optical Lithography

Published:2011-10 Issue:10 Volume:20 Page:2856-2864
ISSN:1057-7149
Container-title:IEEE Transactions on Image Processing
language:
Short-container-title:IEEE Trans. on Image Process.

Author:

Yao Peng ,Jinyu Zhang ,Yan Wang ,Zhiping Yu

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Computer Graphics and Computer-Aided Design,Software

Link

http://xplorestaging.ieee.org/ielx5/83/6019142/05738339.pdf?arnumber=5738339

Cited by 61 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Critical Pattern Selection Method Based on CNN Embeddings for Full-Chip Optimization;Photonics;2023-10-25

3. Implicit function characterization of the curvilinear mask to realize parametric optical proximity correction with a neighborhood parallel tabu search;Applied Optics;2023-06-12

4. An Alternating Direction Method of Multipliers for Inverse Lithography Problem;Numerical Mathematics: Theory, Methods and Applications;2023-06

5. Initiative global NILS control in source and mask optimization for process window enhancement;Applied Optics;2023-03-17

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