Implicit function characterization of the curvilinear mask to realize parametric optical proximity correction with a neighborhood parallel tabu search

Author:

Wei Pengzhi,Li Yanqiu,Li Zhaoxuan,Yuan Miao,Yang He

Abstract

The curvilinear mask structures provide significant benefits in improving lithographic resolution. Curvilinear masks, as opposed to rectilinear masks, have a wider range of structure types that can be used precisely to correct the contour of diffraction at sharp technological nodes. However, the curvilinear structure also makes the inverse design of mask in optical proximity correction (OPC) flow difficult. The current OPC of curvilinear masks uses pixel-based inverse optimization, which is extremely computationally intensive and takes up a lot of design data storage space. This paper proposes an implicit function to represent a large number of curve types with a small number of parameters to reduce computational complexity and the R&D cycle. Therefore, the ultra-high dimensional pixel-based OPC problem is transformed into a low-dimensional parameter search problem in the critical diffraction area of the mask pattern. The tabu search algorithm and neighborhood parallel computing strategy are then used to quickly search for optimal characterized parameters. The results of the simulation show that the parametric curvilinear OPC method achieves a higher image fidelity than that of rectilinear OPC. At the same time, it addresses the shortcomings of the traditional pixelated curvilinear mask OPC method, including high computational complexity, low manufacturability, and storage space occupancy.

Funder

National Science and Technology Major Project

National Natural Science Foundation of China

Publisher

Optica Publishing Group

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference31 articles.

1. Electrically driven optical proximity correction based on linear programming;Banerjee,2008

2. Wafer Topography-Aware Optical Proximity Correction

3. TIP-OPC: a new topological invariant paradigm for pixel based optical proximity correction;Peng,2007

4. Reduction Of Errors Of Microphotographic Reproductions By Optimal Corrections Of Original Masks

5. Investigation of optical proximity correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements;Smith,1999

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