High-Performance 1-V IGZO Thin-Film Transistors Gated With Aqueous and Organic Electrolyte-Anodized Al x O y
Author:
Affiliation:
1. Shandong Technology Center of Nanodevices and Integration, School of Microelectronics, Shandong University, Jinan, China
2. Department of Photonics and Nanoelectronics, Hanyang University, Ansan, Republic of Korea
Funder
Natural Science Foundation of Shandong Province
National Natural Science Foundation of China
Competency Development Program for Industry Specialists of the Korean Ministry of Trade, Industry and Energy (MOTIE), operated by the Korea Institute for Advancement of Technology
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/10025571/09994651.pdf?arnumber=9994651
Reference47 articles.
1. Characterization of Anodic Films on Aluminum Formed in Carboxylate‐Based Nonaqueous Electrolyte Solutions
2. Low voltage operation of IGZO thin film transistors enabled by ultrathin Al2O3 gate dielectric
3. Interface states at the anodized Al2O3-metal interface
4. Characterization of anodic aluminum oxide film and its application to amorphous silicon thin film transistors
5. Current Understanding of Ti Anodisation: Functional, Morphological, Chemical and Mechanical Aspects
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