Field-effect passivation by charge injection into SiNx using a novel low-cost plasma charging method
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Publisher
IEEE
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http://xplorestaging.ieee.org/ielx7/7701171/7749395/07750180.pdf?arnumber=7750180
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Enhanced passivation and stability of negative charge injected SiNx with higher nitrogen content on the boron diffused surface of n-type Si solar cells;Solar Energy Materials and Solar Cells;2024-08
2. Investigation of High Nitrogen Composition $\text{SiN}_{\mathrm{x}}$ for Textured Front Surface Passivation of n-Type Silicon Solar Cells in Terms of Light Stability of Injected Negative Charge and Cell Performance;2023 IEEE 50th Photovoltaic Specialists Conference (PVSC);2023-06-11
3. Investigation on Light Stability of Injected Charge in α-SiNx: H by Plasma Charge Injection Technology;2021 IEEE 48th Photovoltaic Specialists Conference (PVSC);2021-06-20
4. Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface;Progress in Photovoltaics: Research and Applications;2020-10-04
5. N-type silicon solar cell with rear tunnel oxide combined with rear screen-printed electrodes;Japanese Journal of Applied Physics;2018-07-12
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