Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface-Reference-Cited by-同舟云学术

Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface

Published:2020-10-04 Issue:1 Volume:29 Page:54-63
ISSN:1062-7995
Container-title:Progress in Photovoltaics: Research and Applications
language:en
Short-container-title:Prog Photovolt Res Appl

Author:

Min Kwan Hong¹²,Hwang Jeong‐Mo³,Cho Eunwan⁴,Song Hee‐eun¹,Park Sungeun¹,Rohatgi Ajeet⁴,Kim Donghwan²⁵,Lee Hae‐Seok⁵,Kang Yoonmook⁵,Ok Young‐Woo⁴,Kang Min Gu¹^ORCID

Affiliation:

1. Photovoltaics Laboratory Korea Institute of Energy Research Daejeon 34129 Republic of Korea

2. Department of Materials Science and Engineering Korea University Seoul 02841 Republic of Korea

3. Amtech Systems Inc. Tempe AZ 85281 USA

4. School of Electrical and Computer Engineering Georgia Institute of Technology Atlanta GA 30332 USA

5. KU‐KIST Green School, Graduate School of Energy and Environment Korea University Seoul 02841 Republic of Korea

Funder

National Research Foundation of Korea

U.S. Department of Energy

Korea Institute of Energy Technology Evaluation and Planning

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pip.3340

Reference45 articles.

1. Surface recombination velocity of phosphorus-diffused silicon solar cell emitters passivated with plasma enhanced chemical vapor deposited silicon nitride and thermal silicon oxide

2. Progress in Low-temperature Surface Passivation of Silicon Solar Cells using Remote-plasma Silicon Nitride

3. Carrier recombination at silicon–silicon nitride interfaces fabricated by plasma-enhanced chemical vapor deposition

4. Dielectric surface passivation for silicon solar cells: A review

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3. Investigation on Light Stability of Injected Charge in α-SiNx: H by Plasma Charge Injection Technology;2021 IEEE 48th Photovoltaic Specialists Conference (PVSC);2021-06-20