Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for field‐effect passivation on a boron‐doped silicon surface

Author:

Min Kwan Hong12,Hwang Jeong‐Mo3,Cho Eunwan4,Song Hee‐eun1,Park Sungeun1,Rohatgi Ajeet4,Kim Donghwan25,Lee Hae‐Seok5,Kang Yoonmook5,Ok Young‐Woo4,Kang Min Gu1ORCID

Affiliation:

1. Photovoltaics Laboratory Korea Institute of Energy Research Daejeon 34129 Republic of Korea

2. Department of Materials Science and Engineering Korea University Seoul 02841 Republic of Korea

3. Amtech Systems Inc. Tempe AZ 85281 USA

4. School of Electrical and Computer Engineering Georgia Institute of Technology Atlanta GA 30332 USA

5. KU‐KIST Green School, Graduate School of Energy and Environment Korea University Seoul 02841 Republic of Korea

Funder

National Research Foundation of Korea

U.S. Department of Energy

Korea Institute of Energy Technology Evaluation and Planning

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

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