Low frequency noise variability in high-k/metal gate stack 28nm bulk and FD-SOI CMOS transistors-Reference-Cited by-同舟云学术

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Low frequency noise variability in high-k/metal gate stack 28nm bulk and FD-SOI CMOS transistors

Published:2011-12 Issue: Volume: Page:
ISSN:
Container-title:2011 International Electron Devices Meeting
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Author:

Ioannidis E. G.,Haendler S.,Bajolet A.,Pahron T.,Planes N.,Arnaud F.,Bianchi R.A.,Haond M.,Golanski D.,Rosa J.,Fenouillet-Beranger C.,Perreau P.,Dimitriadis C.A.,Ghibaudo G.

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx5/6123666/6131464/06131581.pdf?arnumber=6131581

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