Large signal linearity enhancement of AlGaN/GaN high electron mobility transistors by device-level Vt engineering for transconductance compensation
Author:
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/8255107/8268301/08268457.pdf?arnumber=8268457
Cited by 21 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Evaluation of Power and Linearity at 30 GHz in AlGaN/GaN HEMT Fabricated by Integrating Transistors With Multiple Threshold Voltages;IEEE Transactions on Electron Devices;2024-03
2. A Comparative Study on the Effects of Planarity of Access Region on the Low-Frequency Noise Performance of InAlN/GaN HFETs;IEEE Journal of the Electron Devices Society;2024
3. Investigation of the DC Performance and Linearity of InAlN/GaN HFETs via Studying the Impact of the Scaling of LGS and LG on the Source Access Resistance;IEEE Journal of the Electron Devices Society;2024
4. Impact of the Scaling of LGS and LG on the On-State Breakdown Voltage of InAlN/GaN HFETs With Localized Fin Under the Gate Electrode;IEEE Journal of the Electron Devices Society;2024
5. A novel multi-threshold coupling InAlN/GaN double-channel HEMT for improving transconductance flatness;Science China Information Sciences;2023-12-19
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