Author:
Sato Y.,Anzai K.,Tadokoro F.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Industrial and Manufacturing Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Cited by
4 articles.
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4. Comments, with reply, on "Dose perturbation by wafer charging during ion implantation" by Y. Sato et al;IEEE Transactions on Semiconductor Manufacturing;1993-08