Author:
Current Michael I,Lukaszek Wes,Vella Michael C,Tripsas Nicholas H
Subject
Instrumentation,Nuclear and High Energy Physics
Reference20 articles.
1. Proc. 1994 IEEE Int. Reliability Physics Symp.;Schuegraf,1994
2. Process‐Induced Gate Oxide Charge Collector Damage
3. Control of surface charging during high current ion implantation
4. UC Berkeley Extension Short Course on Wafer Charging Effects in Ion Implantation Processing;Vella;LBL report LBL-34970,1993
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Etching of glass, silicon, and silicon dioxide using negative ionic liquid ion sources;Journal of Vacuum Science & Technology B;2018-09
2. Ion Implantation;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09
3. Charging of substrates irradiated by particle beams;Applied Physics Letters;1997-12
4. Ion beams in silicon processing and characterization;Journal of Applied Physics;1997-05-15
5. Ion implantation for silicon device manufacturing: A vacuum perspective;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-05