Radiation Resistance of SOI Pixel Devices Fabricated With OKI 0.15 $\mu {\rm m}$ FD-SOI Technology-Reference-Cited by-同舟云学术

Radiation Resistance of SOI Pixel Devices Fabricated With OKI 0.15 $\mu {\rm m}$ FD-SOI Technology

Published:2009-10 Issue:5 Volume:56 Page:2896-2904
ISSN:0018-9499
Container-title:IEEE Transactions on Nuclear Science
language:
Short-container-title:IEEE Trans. Nucl. Sci.

Author:

Hara Kazuhiko,Kochiyama Mami,Mochizuki Ai,Sega Tomoko,Arai Yasuo,Fukuda Koichi,Hayashi Hirokazu,Hirose Minoru,Ida Jiro,Ikeda Hirokazu,Ikegami Yoichi,Ikemoto Yukiko,Kawai Yasuaki,Kohriki Takashi,Komatsubara Hirotaka,Miyake Hideki,Miyoshi Toshinobu,Ohno Morifumi,Okihara Masao,Terada Susumu,Tsuboyama Toru,Unno Yoshinobu

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Nuclear Energy and Engineering,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx5/23/5280476/05280514.pdf?arnumber=5280514

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