Author:
Hanley P. R.,Ehrlich C. D.
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Nuclear Energy and Engineering,Nuclear and High Energy Physics
Cited by
9 articles.
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1. DOSIMETRY DESIGN CONSIDERATIONS FOR SERIAL AND BATCH ION IMPLANTATION SYSTEMS;Ion Implantation Technology–92;1993
2. Nonintrusive position measurement of magnetically scanned ion beams;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02
3. The Extrion 1000: A new high current ion implantation system for automated fabrication environments and intelligent process control;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02
4. Dose control system for the Extrion 1000 ion implantation system;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1989-02
5. Ion Implantation for VLSI;VLSI Electronics Microstructure Science;1989