1. W. Shockley, U.S. patent 2,787,564 (XXXX1954YYYY).
2. “Ion Implantation.”;Dearnaley,1973
3. “Ion Implantation in Semiconductors,”;Mayer,1970
4. A history of commercial implantation
5. Model 200–20 ion implanter, was available from Varian/Extrion Division, Blackburn Industrial Park Boulevard, Gloucester, MA 01930.