Dose control system for the Extrion 1000 ion implantation system
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference8 articles.
1. these Proceedings 7th Int. Conf. on Ion Implantation Technology;Liebert,1989
2. The precision implant 9000 beam line
3. Applications of Magnetic Scanning to High Current Implantation
4. High current dosimetry techniques
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-resolution ion beam profiler for ion implanters;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-05
2. Non-intercepting continuous beam current measurement for a high-current ion implanter;Surface and Coatings Technology;1994-08
3. Wafer Charge Control in the E1000 Ion Implanter;Ion Implantation Technology–92;1993
4. Process Control Issues in the Varian E1000 High Current Implanter;Ion Implantation Technology–92;1993
5. Measuring the position and profile of an ion beam in systems with ‘R-theta’ scanning;Ion Implantation Technology–92;1993
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