High-resolution ion beam profiler for ion implanters-Reference-Cited by-同舟云学术

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High-resolution ion beam profiler for ion implanters

Published:1995-05 Issue:1-4 Volume:99 Page:573-575
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Szajnowski W.J.,Stephens K.G.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference6 articles.

1. Ion Implantation Technology — 92;Benveniste,1993

2. A high-resolution beam profile measuring system for high-current ion implanters

3. Dose control system for the Extrion 1000 ion implantation system

4. Ion Implantation Technology — 92;Krafcsik,1993

5. W.J. Szajnowski, J.G. England, K.G. Stephens, I. Fotheringham and D. Scargill, Proc. Conf. Ion Implantation Technology — 94, Catania, to be published.

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