Phase Transitions and Anti-Ferroelectric Behaviors in Hf1-xZrxO2 Films
Author:
Affiliation:
1. College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou, China
2. International Joint Innovation Center, Zhejiang University, Haining, China
Funder
National Key Research and Development Program of China
Key Research and Development Program of Zhejiang Province
“Pioneer” and “Leading Goose” Research and Development Program of Zhejiang Province
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/55/10265125/10237261.pdf?arnumber=10237261
Reference21 articles.
1. Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film
2. Nonequilibrium polarization dynamics in antiferroelectrics
3. Phase Relations and Volume Changes of Hafnia under High Pressure and High Temperature
4. Morphotropic Phase Boundary of Hf1–xZrxO2 Thin Films for Dynamic Random Access Memories
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Anti-Ferroelectric ZrO2 Capacitors With Ultralow Operating Voltage (<1.2 V) and Improved Endurance Toward Logic Compatible eDRAM;IEEE Transactions on Electron Devices;2024-09
2. Impact of Hafnium Doping on Phase Transition, Interface, and Reliability Properties of ZrxHf1–xO2-Based Capacitors;ACS Applied Electronic Materials;2024-08-15
3. Dynamic evolution of oxygen vacancies during cycling in antiferroelectric HfxZr1−xO2;Applied Physics Letters;2024-06-10
4. Orthorhombic-I Phase and Related Phase Transitions: Mechanism of Superior Endurance $(> 10^{14})$ of HfZrO Anti-ferroelectrics for DRAM Applications;2024 IEEE International Reliability Physics Symposium (IRPS);2024-04-14
5. Modeling of Endurance Degradation of Anti-Ferroelectric HF1-xZRxO2 Capacitors;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3