Low-Energy Ion-Assisted Deposition of Boron Nitride Films in Surface-Wave Plasma-Reference-Cited by-同舟云学术

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Low-Energy Ion-Assisted Deposition of Boron Nitride Films in Surface-Wave Plasma

Published:2016-12 Issue:12 Volume:44 Page:3219-3222
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Torigoe M.,Teii K.^ORCID,Matsumoto S.

Funder

Grant-in-Aid for Scientific Research (B) from the Japan Society for the Promotion of Science

Funding Program for Next Generation World-Leading Researchers from Cabinet Office, Government of Japan

Iketani Science and Technology Foundation

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Condensed Matter Physics,Nuclear and High Energy Physics

Link

http://xplorestaging.ieee.org/ielx7/27/7762697/07762178.pdf?arnumber=7762178

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of the boron-to-nitrogen ratio on leakage current characteristics of boron nitride films prepared by surface-wave plasma enhanced chemical vapor deposition;Thin Solid Films;2020-07

2. Effect of low-energy ion impact on the structure of hexagonal boron nitride films studied in surface-wave plasma;Surface and Interface Analysis;2018-11-08

3. Theoretical study of dissociative recombination and vibrational excitation of the ${\mathrm{BF}}_{2}^{+}$ ion by an electron impact;Plasma Sources Science and Technology;2018-11-07

4. Recent progress in plasma-assisted synthesis and modification of 2D materials;2D Materials;2018-04-16

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