Multi-Modal Extreme-Ultraviolet Reflectometer: Solving Inverse Problems in Nanostructure Metrology
Author:
Affiliation:
1. JILA, STROBE NSF Science and Technology Center, University of Colorado Boulder and NIST,Department of Physics,Boulder,CO,USA,80309
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx8/10576197/10576231/10576406.pdf?arnumber=10576406
Reference19 articles.
1. International Roadmap for Devices and Systems: Metrology;Orji;IEEE,2022
2. Metrology for the next generation of semiconductor devices
3. Tabletop extreme ultraviolet reflectometer for quantitative nanoscale reflectometry, scatterometry, and imaging
4. Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry
5. Temporal and spectral multiplexing for EUV multibeam ptychography with a high harmonic light source
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