The Application of LAU's Schottky-Poole-Frenkel Theory to Distinguish Leakage Current Mechanisms in High-K MIM Capacitors by Pattern Recognition
Author:
Affiliation:
1. Nanyang Technological University (Retired), School of EEE,Singapore,639798
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9856647/9856709/09856741.pdf?arnumber=9856741
Reference8 articles.
1. An Extended Unified Schottky-Poole-Frenkel Theory to Explain the Current-Voltage Characteristics of Thin Film Metal-Insulator-Metal Capacitors with Examples for Various High-k Dielectric Materials
2. Impact of Top (Pt, Au, and Al) Electrodes on HfAlO[sub x]-Based MIM Capacitors
3. The application of the Smoluchowski effect to explain the current-voltage characteristics of high-k MIM capacitors
4. The variation of the leakage current characteristics of W/Ta2O5/W MIM capacitors with the thickness of the bottom W electrode
5. Mechanism B I-V Symmetry for MIM Capacitors Used in Microelectronics
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The Secret of the Leakage Current Mechanism in Some Historical Device-Quality High-K Metal-Insulator-Metal Capacitors;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
2. Potential Confusion in the Analysis of the Current-Voltage Characteristics of High-K Dielectric on Lightly Doped P-Type Silicon MIS Capacitors;2024 Conference of Science and Technology for Integrated Circuits (CSTIC);2024-03-17
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