Potential Confusion in the Analysis of the Current-Voltage Characteristics of High-K Dielectric on Lightly Doped P-Type Silicon MIS Capacitors
Author:
Affiliation:
1. Nanyang Technological University (Retired), School of EEE,Singapore,639798
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10531806/10531771/10531938.pdf?arnumber=10531938
Reference9 articles.
1. Frequency response of the surface inversion layer in silicon
2. Lateral AC current flow model for metal-insulator-semiconductor capacitors
3. XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta2O5 thin films onto p-Si substrates
4. Tantalum Oxide Thin Films for Dielectric Applications by Low‐Pressure Chemical Vapor Deposition: Physical and Electrical Properties
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