Thermal Sensitivity Mapping with OBIRCH
Author:
Affiliation:
1. Product Quality Centre Kuala Lumpur,NXP Semiconductors,Petaling Jaya,Selangor,Malaysia,47300
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10248978/10248979/10249087.pdf?arnumber=10249087
Reference11 articles.
1. Design and Simulation for Producing Two Amplitude Matched Anti-phase Sine Waveforms Using ±2.5 V CMOS Current-Mode Approach;sharma;IJCSE International Journal on Computer Science and Engineering,2010
2. Soft Defect Localization of Hot Failure by Dynamic Analysis by Laser Stimulation using Hamamatsu iPhemos;llamera;Proc IEEE Int Symp Physical and Failure Analysis Integrated Circuits (IPFA),2018
3. Random error effects in matched MOS capacitors and current sources
4. Optical beam induced resistance change (OBIRCH): overview and recent results
5. New capabilities of OBIRCH method for fault localization and defect detection
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