High-Frequency Characterization and Modeling of Low and High Voltage FinFETs for RF SoCs
Author:
Affiliation:
1. Indian Institute of Technology Kanpur,Kanpur,India,208016
2. MaxLinear Inc.,Carlsbad,California,USA,92008
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10102927/10102928/10103010.pdf?arnumber=10103010
Reference10 articles.
1. High-voltage-tolerant i/o buffers with low-voltage cmos process;singh;IEEE Journal of Solid-State Circuits,1999
2. Extraction of Isothermal Condition and Thermal Network in UTBB SOI MOSFETs
3. Analog and RF Characteristics of Power FinFET Transistors With Different Drain-Extension Designs
4. FinFET LDMOS technology challenges and opportunities for digital TV and 6GHz WiFi PA applications;singh;2021 Symposium on VLSI Technology,2021
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Improved RF Performance with Buried Power Rail and Contact over Active Gate in Nanosheet FETs;2024 IEEE International Symposium on Circuits and Systems (ISCAS);2024-05-19
2. Small-Signal and Large-Signal RF Characterization and Modeling of Low and High Voltage FinFETs for 14/16 nm Technology Node SoCs;IEEE Journal of the Electron Devices Society;2024
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