Analog and RF Characteristics of Power FinFET Transistors With Different Drain-Extension Designs

Author:

Chen Bo-Yuan,Chen Kun-MingORCID,Chiu Chia-Sung,Huang Guo-WeiORCID,Chen Hsiu-Chih,Chen Chun-ChiORCID,Hsueh Fu-Kuo,Chang Edward YiORCID

Funder

Center for Semiconductor Technology Research through The Featured Areas Research Center Program within the framework of the Higher Education Sprout Project by the Ministry of Education in Taiwan

Ministry of Science and Technology, Taiwan

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. High-Frequency Characterization and Modeling of Low and High Voltage FinFETs for RF SoCs;2023 7th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2023-03-07

2. TCAD performance analysis of a symmetrical double gate non-aligned junction FET device with high and low dielectric gate oxide in sub-100 nm regime;International Journal of Electronics Letters;2023-02-16

3. A drain extended FinFET with enhanced DC/RF performance for high-voltage RF applications;Semiconductor Science and Technology;2022-10-05

4. Design and Analysis of Junctionless FinFET with Gaussian Doped for Non-polar Structure;Silicon;2022-01-05

5. Reliability and PVT simulation of FinFET circuits using Cadence Virtuoso;2021 5th International Conference on Electrical, Electronics, Communication, Computer Technologies and Optimization Techniques (ICEECCOT);2021-12-10

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