Re-Examination of Vth Window and Reliability in HfO2 FeFET Based on the Direct Extraction of Spontaneous Polarization and Trap Charge during Memory Operation-Reference-Cited by-同舟云学术

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Re-Examination of Vth Window and Reliability in HfO2 FeFET Based on the Direct Extraction of Spontaneous Polarization and Trap Charge during Memory Operation

Published:2020-06 Issue: Volume: Page:
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Container-title:2020 IEEE Symposium on VLSI Technology
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Author:

Ichihara Reika,Suzuki Kunifumi,Kusai Haruka,Ariyoshi Keiko,Akari Keisuke,Takano Keisuke,Kamiya Kazuhiro Matsuo Yuta,Takahashi Kota,Miyagawa Hidenori,Kamimuta Yuuichi,Sakuma Kiwamu,Saitoh Masumi

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/9264988/9264985/09265055.pdf?arnumber=9265055

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Modeling the Coupled Charge Trapping Dynamics in FeFETs for Reliability Characterizations;IEEE Transactions on Electron Devices;2024-09

2. Comprehensive Experiments and Modeling Applicable for Ferroelectric Transistors With an MFMIS Structure and a Wide Range of Area Ratios: Unveiling the Operation Mechanisms;IEEE Transactions on Electron Devices;2024-09

3. Study of Endurance Performance of SiO₂ Interfacial Layer Scaling Through O Scavenging in Si Channel n-FeFET With Si:HfO₂ Ferroelectric Layer;IEEE Transactions on Electron Devices;2024-08

4. Role of Nitrogen in Suppressing Interfacial States Generation and Improving Endurance in Ferroelectric Field-Effect Transistors;IEEE Transactions on Electron Devices;2024-08

5. Impact of Doped Hafnium Oxides on Memory Window and Low-Frequency Noise in Ferroelectric FETs;IEEE Transactions on Electron Devices;2024-07

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