Ruthenium metallization for advanced interconnects-Reference-Cited by-同舟云学术

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Ruthenium metallization for advanced interconnects

Published:2016-05 Issue: Volume: Page:
ISSN:
Container-title:2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC)
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Author:

Liang Gong Wen ,Adelmann Christoph,Pedreira Olalla Varela,Dutta Shibesh,Popovici Mihaela,Briggs Basoene,Heylen Nancy,Vanstreels Kris,Wilson Christopher J.,Van Elshocht Sven,Croes Kristof,Bommels Jurgen,Tokei Zsolt

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/7502234/7507634/07507651.pdf?arnumber=7507651

Cited by 73 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Epitaxial Ru Nanowire on Single-Crystalline Graphene for Advanced Interconnect Application;ACS Applied Electronic Materials;2024-08-10

3. Machine Learning Inspired Nanowire Classification Method based on Nanowire Array Scanning Electron Microscope Images;Open Research Europe;2024-06-28

4. Numerical evaluation of grain boundary electron scattering in molybdenum thin films: A critical analysis for advanced interconnects;Vacuum;2024-04

5. Machine Learning Inspired Nanowire Classification Method based on Nanowire Array Scanning Electron Microscope Images;Open Research Europe;2024-03-01

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