Silicon-Germanium (SiGe) composition and thickness determination via simultaneous smallspot XPS and XRF measurements-Reference-Cited by-同舟云学术

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Silicon-Germanium (SiGe) composition and thickness determination via simultaneous smallspot XPS and XRF measurements

Published:2014-05 Issue: Volume: Page:
ISSN:
Container-title:25th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC 2014)
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Author:

L'herron Benoit,Loubet Nicolas,Qing Liu ,Wei Ti Lee ,Klare Mark,Pois Heath,Kwan Mike,Ying Wang ,Larson Tom,Farhat Saiqa,Fullam Jennifer,Gaudiello John,Rangarajan Srinivasan,Bing Sun ,Wacquez Romain,Maitrejean Sylvian

Publisher

IEEE

Link

http://xplorestaging.ieee.org/ielx7/6843030/6846940/06846971.pdf?arnumber=6846971

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Red Zn2SiO4:Eu3+ and Mg2TiO4:Mn4+ nanophosphors for on-site rapid optical detections: Synthesis and characterization;Applied Physics A;2021-07-10

2. Advanced quantitative analysis of epitaxial SiGe composition on production wafer for logic devices;Surface and Interface Analysis;2017-11-07

3. Benefits of XPS nanocharacterization for process development and industrial control of thin SiGe channel layers in advanced CMOS technologies;Materials Science in Semiconductor Processing;2017-11

4. Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA);SPIE Proceedings;2016-03-29

5. XPS-XRF hybrid metrology enabling FDSOI process;SPIE Proceedings;2016-03-24

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