Inorganic capping layers in advanced photosensitive polymer based RDL processes: processing and reliability
Author:
Pinho Nelson1,
Chery Emmanuel1,
Bhatia Ritwik2,
Sundaram Ganesh2,
Slabbekoorn John1,
Krishtab Mikhail1,
Miller Andy1,
Beyne Eric1
Affiliation:
1. Imec,Leuven,Belgium
2. Veeco,Waltham,MA,USA