Conquering Process Variability: A Key Enabler for Profitable Manufacturing in Advanced Technology Nodes
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Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx5/4479864/4492987/04493000.pdf?arnumber=4493000
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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2. Predictive evaluation of electrical characteristics of sub-22nm FinFET technologies under device geometry variations;Microelectronics Reliability;2014-09
3. The impact of device width on the variability of post-irradiation leakage currents in 90 and 65 nm CMOS technologies;Microelectronics Reliability;2012-11
4. Introduction;RF-Frontend Design for Process-Variation-Tolerant Receivers;2012
5. Variation-aware multimetric optimization during gate sizing;ACM Transactions on Design Automation of Electronic Systems;2009-08
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