A New Approach for Reconfigurable Multifunction Logic-in-Memory Using Complementary Ferroelectric-FET (CFeFET)
Author:
Affiliation:
1. Institute of Electronics, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
2. International College of Semiconductor Technology, National Yang Ming Chiao Tung University, Hsinchu, Taiwan
Funder
National Science and Technology Council, Taiwan
Featured Areas Research Center Program “Center for Semiconductor Technology Research” through the Framework of the Higher Education Sprout Project by the Ministry of Education, Taiwan
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://xplorestaging.ieee.org/ielx7/16/10194493/10168056.pdf?arnumber=10168056
Reference14 articles.
1. A Study of Endurance Issues in HfO2-Based Ferroelectric Field Effect Transistors: Charge Trapping and Trap Generation
2. ASAP7: A 7-nm finFET predictive process design kit
3. Ferroelectric HfO2 Memory Transistors With High-κ Interfacial Layer and Write Endurance Exceeding 1010 Cycles
4. NLS based Modeling and Characterization of Switching Dynamics for Antiferroelectric/Ferroelectric Hafnium Zirconium Oxides
5. Monte Carlo Simulation of Switching Dynamics in Polycrystalline Ferroelectric Capacitors
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