Demonstration of High Voltage (>2KV) GaN-on-QST power MIS-HEMTs with the Stable Dynamic On-resistance up to 1650 V
Author:
Affiliation:
1. National Yang Ming Chiao Tung University,International College of Semiconductor Technology,Taiwan
Funder
National Science and Technology Council
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10261884/10261892/10261913.pdf?arnumber=10261913
Reference11 articles.
1. Effective Passivation With High-Density Positive Fixed Charges for GaN MIS-HEMTs
2. Studies on High-Voltage GaN-on-Si MIS-HEMTs Using LPCVD Si3N4as Gate Dielectric and Passivation Layer
3. GaN MIS-HEMTs With Nitrogen Passivation for Power Device Applications
4. Epitaxial buffer structures grown on 200 mm engineering substrates for 1200 V E-mode HEMT application
5. AlGaN/GaN MIS-HEMT with PECVD SiNx, SiON, SiO2 as Gate Dielectric and Passivation Layer
Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The Study of Normally-on Power GaN HEMTs in QST Substrate with High Breakdown Voltage;2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA);2024-04-22
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