Quasi-Physical Equivalent Circuit Model of RF Leakage Current in Substrate Including Temperature Dependence for GaN-HEMT on Si
Author:
Affiliation:
1. Information Technology Research and Development Center, Mitsubishi Electric Corporation, Kamakura, Japan
2. Department of Electronic Engineering, Saga University, Saga, Japan
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Radiation
Link
http://xplorestaging.ieee.org/ielx7/22/10120630/10014639.pdf?arnumber=10014639
Reference31 articles.
1. GaN and Si transistors on 300 mm Si(111) enabled by 3D monolithic heterogeneous integration;then;Proc IEEE Symp VLSI Technol,2020
2. CMOS compatible GaN-on-Si HEMT technology for RF applications: analysis of substrate losses and non-linearities
3. A fully-integrated S/C band transmitter in 45 nm CMOS/ 0.2gm GaN heterogeneous technology;larue;Proc IEEE Compound Semiconductor Integr Circuit Symp (CSICS),2017
4. High Performance Mixed Signal and RF Circuits Enabled by the Direct Monolithic Heterogeneous Integration of GaN HEMTs and Si CMOS on a Silicon Substrate
5. Simulation study of gate leakage current under three-terminal operation in AlGaN/GaN HEMTs;oishi;Proc 10th Top Workshop Heterostructure Microelectron (TWHM),2013
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