Impact of In-Plane Residual Stress on The Performance of The Film Bulk Acoustic Resonators
Author:
Affiliation:
1. Institute of Microelectronics,Agency for Science, Technology and Research (A*STAR),Singapore
Funder
Science and Engineering Research Council
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10306337/10306342/10306787.pdf?arnumber=10306787
Reference9 articles.
1. A Snapshot in Time: The Future in Filters for Cell Phones
2. Sub-100nm Al0.7Sc0.3N Thin Films for Next Generation Bulk Acoustic Wave Resonators and Filters
3. A comparison of FBAR oscillators with standard resonators and stress relieved resonators
4. Residual stress reduction in piezoelectric Sc0.4Al0.6N films by variable-pressure sputtering from 0.4 to 1.0 Pa
5. The impact of residual stress on resonating piezoelectric devices
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A Comprehensive Approach for Total Suppression of In-Band Spurious Modes in UHF Al0.72Sc0.28N Lamb Wave Resonators and Filters;Journal of Microelectromechanical Systems;2024-08
2. Highly Doped Single Crystal Al$_{\text{1}-\textit{x}}$Sc$_{\textit{x}}$N Bulk Acoustic Resonators for High-Frequency and Wideband Applications;IEEE Transactions on Electron Devices;2024
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3