Gate Leakage Current and Time-Dependent Dielectric Breakdown Measurements of Commercial 1.2 kV 4H-SiC Power MOSFETs

Author:

Liu Tianshi,Zhu Shengnan,Yu Susanna,Xing Diang,Salemi Arash,Kang Minseok,Booth Kristen,White Marvin H.,Agarwal Anant K.

Publisher

IEEE

Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Investigation of different screening methods on threshold voltage and gate oxide lifetime of SiC Power MOSFETs;2023 IEEE International Reliability Physics Symposium (IRPS);2023-03

2. Reliability Comparison of Commercial Planar and Trench 4H-SiC Power MOSFETs;2023 IEEE International Reliability Physics Symposium (IRPS);2023-03

3. Effects of Oxide Electric Field Stress on the Gate Oxide Reliability of Commercial SiC Power MOSFETs;2022 IEEE 9th Workshop on Wide Bandgap Power Devices & Applications (WiPDA);2022-11-07

4. 1200-V SiC MOSFET Short-Circuit Ruggedness Evaluation and Methods to Improve Withstand Time;IEEE Journal of Emerging and Selected Topics in Power Electronics;2022-10

5. Time-dependent Multiple Gate Voltage Reliability of Hybrid Ferroelectric Charge Trap Gate Stack (FEG) GaN HEMT for Power Device Applications;2022 IEEE Latin American Electron Devices Conference (LAEDC);2022-07-04

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