Solid state: X-ray lithography breaks the submicrometer barrier; A new X-ray lithography system allowed Bell Labs engineers to make the smallest, fastest MOSFETs yet reported-Reference-Cited by-同舟云学术

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Solid state: X-ray lithography breaks the submicrometer barrier; A new X-ray lithography system allowed Bell Labs engineers to make the smallest, fastest MOSFETs yet reported

Published:1981-05 Issue:5 Volume:18 Page:26-29
ISSN:0018-9235
Container-title:IEEE Spectrum
language:
Short-container-title:IEEE Spectr.

Author:

Lepselter Martin P.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering

Link

http://xplorestaging.ieee.org/ielx5/6/6369491/06369505.pdf?arnumber=6369505

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of preionization on soft x-ray emission and plasma dynamics in a small plasma focus system;Journal of Applied Physics;2010-04

2. VLSI Trends;VLSI Electronics Microstructure Science;1989

3. Generation of soft x rays using a rare gas‐hydrogen plasma focus and its application to x‐ray lithography;Applied Physics Letters;1986-03-17

4. The VLSI design of a two dimensional image processing array;Microprocessing and Microprogramming;1984-10

5. X-Ray Lithography Applied To The Fabrication Of One Micrometer N-Channel Metal Oxide Semiconductor Circuits;Optical Engineering;1983-04-01

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