Interfacial-Layer-Free Ge0.95Si0.05 Nanosheet FeFETs

Author:

Hsieh Wan-Hsuan1ORCID,Chen Yu-Rui1ORCID,Liu Yi-Chun1ORCID,Zhao Zefu1ORCID,Lee Jia-Yang2,Tu Chien-Te1ORCID,Huang Bo-Wei1ORCID,Wang Jer-Fu1ORCID,Lee M. H.3ORCID,Liu C. W.4ORCID

Affiliation:

1. Graduate Institute of Electronics Engineering, National Taiwan University, Taipei, Taiwan

2. Institute and Undergraduate Program of Electro-Optical Engineering, and the Graduate School of Advance Technology, National Taiwan University, Taipei, Taiwan

3. Graduate School of Advance Technology, National Taiwan University, Taipei, Taiwan

4. Department of Electrical Engineering, Graduate Institute of Electronics Engineering, the Graduate Institute of Photonics and Optoelectronics, and the Graduate School of Advanced Technology, National Taiwan University, Taipei, Taiwan

Funder

“Center for Advanced Semiconductor Technology Research” through the Featured Areas Research Center Program within the Framework of the Higher Education Sprout Project

Ministry of Education (MOE) in Taiwan

National Science and Technology Council, Taiwan

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

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