New Mobility Model for Accurate Modeling of Transconductance in FDSOI MOSFETs

Author:

Lin Yen-KaiORCID,Kushwaha PragyaORCID,Duarte Juan PabloORCID,Chang Huan-Lin,Agarwal HarshitORCID,Khandelwal Sourabh,Sachid Angada B.ORCID,Harter MichaelORCID,Watts JosefORCID,Chauhan Yogesh SinghORCID,Salahuddin Sayeef,Hu Chenming

Funder

Semiconductor Research Corporation

Berkeley Device Modeling Center, University of California at Berkeley, Berkeley, CA 94720 USA.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Planar MOSFETs and Their Application to IC Design;Springer Handbook of Semiconductor Devices;2022-11-11

2. Synthesis of Wafer‐Scale Graphene with Chemical Vapor Deposition for Electronic Device Applications;Advanced Materials Technologies;2021-04-23

3. BSIM-IMG: Advanced Model for FDSOI Transistors with Back Channel Inversion;2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM);2020-04

4. The Optimizations of Dual-Threshold Independent-Gate FinFETs and Low-Power Circuit Designs;Journal of Circuits, Systems and Computers;2019-09-23

5. Channel Current Model With Real Device Effects in BSIM-IMG;Industry Standard FDSOI Compact Model BSIM-IMG for IC Design;2019

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