Superjunction SiC TCOX-MOSFET: Study and Comparison

Author:

Zhang Juncheng1,Jiang Yunteng1,Huang Haimeng1,Zhang Zimin2,Cheng Junji1,Yi Bo1,Yang Hongqiang1,Wang Zhiming1

Affiliation:

1. University of Electronic Science and Technology of China,Chengdu,China,610054

2. Priosemi Technology Limited Company,Wuxi,China,214000

Publisher

IEEE

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A Novel Dielectric Modulated Double Gate Charge-Trapping MOSFET: Ferroelectric Gate Stack and Gaussian Doped Substrate Integration for Enhanced Performance;2024 IEEE International Conference on Information Technology, Electronics and Intelligent Communication Systems (ICITEICS);2024-06-28

2. A novel split-gate trench MOSFET embedded with a high-k pillar for higher breakdown voltage;Semiconductor Science and Technology;2024-02-08

3. Study of Two Novel Ultra-Low Specific On-Resistance 4H-SiC SGT MOSFETs;2024 IEEE 4th International Conference on Power, Electronics and Computer Applications (ICPECA);2024-01-26

4. A Reliable Packaging Design for 1200-V, 500-A SiC Half-bridge Modules with Junction Temperature over 200 °C;2023 IEEE 6th International Electrical and Energy Conference (CIEEC);2023-05-12

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